Nanoelectronics research specialist, imec, has started the installation of ASML's pre-production Extreme UltraViolet Lithography (EUVL) scanner, the NXE:3100. ASML provides lithography systems for the ...

Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

Imec and ASML have patterned structures using High NA with the 0.55NA EUV scanner down to 9,5nm (19 nm pitch), random vias with 30nm center-to-center distance, 2D features at 22nm pitch, and a DRAM ...

China is now accused of doing what Washington spent years trying to prevent: building its own version of the world’s most advanced chipmaking tool and edging closer to independence from foreign ...

According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...

Christophe Fouquet, President, CEO and Chair of the Board of Management, announced the reappointment of Roger Dassen and Frederic Schneider-Maunoury to the Board of Management and the appointment of ...

ASML today introduced a dual-stage ArF (193nm) lithography system for 300mm processingwith 100nm resolution. The Veldhoven, Netherlands-based company is billing the AT:1100 ArFSystem as an industry ...