The big joke about extreme ultraviolet (EUV) technology is that it takes seven trucks to deliver the mammoth tools compared to one for other advanced lithography tools — but actually, this is no joke.
Double patterning looks like being the lithography tool of choice at 32nm, but how do you absorb the inevitable extra costs of a double lithography process? According to Applied Materials, the world’s ...
SAN JOSE, Calif. — Immersion lithography could be late to the market, forcing chip makers to consider 193-nm “dry” and double-exposure techniques for chip production at the 45-nm node and beyond, ...
In the creative, or desperate, rush to find ways to pattern 10 nm node using double patterning immersion 193nm lithography, a designer from ARM is left “crying in his beer” at the consequent design ...
Pattern-shaping technology: a breakthrough innovation for the patterning engineer's toolkit. Applied Materials’ pattern-shaping technology brings an entirely new capability to chipmakers, enabling ...
TSMC has delivered two 20nm foundry-first reference flows. One enables enables double patterning technology design using proven design flows. The other supports Chip On Wafer On Substrate (CoWoS) ...
Extreme ultraviolet (EUV) lithography finally is moving into production, but foundry customers now must decide whether to implement their designs using EUV-based single patterning at 7nm, or whether ...
BELMONT, Calif.--(BUSINESS WIRE)--Nikon Corporation has announced they will provide an immersion scanner for Double Patterning, based on the successful NSR-S610C platform, to their customers in the ...
Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...
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